Direct atmospheric pressure plasma device for film.
Achieving high-speed surface modification of films in a nitrogen atmosphere.
Achieving uniform discharge even with inexpensive nitrogen gas. The film is processed uniformly at high speed. Active particles in the plasma (such as atomic oxygen) cut some of the bonds of organic molecules in the film and resin, forming new functional groups. This significantly improves the adhesion and wettability of the surface. 【Features】 ■ Multi-Gas Technology Maximizing the expertise of industrial gas manufacturers to accommodate all surface modifications. → Improvement of film wettability and adhesion ■ High Throughput Adopting a direct method that inserts the processing target between electrodes, enabling high-speed continuous processing. ■ Abundant Variations Various achievements with fluorine-based, PET, polyimide films, etc., capable of single-sided and double-sided processing. Film width up to 2000mm. *For more details, please download the catalog or contact us.
- Company：エア・ウォーター
- Price：Other
